Dutch participation Creative Industry Week awarded
2009-11-05
During the closing ceremony of the Shanghai International Creative Industry Week, the Shanghai Creative Industry Centre awarded the Dutch participation with the ‘Award for Best Exhibition of SICIW 2009’, for the Architecture and Public Space presentation. The award was received by Maurice Pourchez of the Consulate General of the Kingdom of The Netherlands in Shanghai. The SICIW took place between 15 and 21 October.
The Dutch participation was initiated by Dutch Design Fashion Architecture (DutchDFA) and partner FAR Architecture & Design Centre Shanghai. The 3D exhibition design was done by DaF architects from Rotterdam. Studio Dumbar China was responsible for the design of the all over event style and exhibition graphics.
